Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/124577
Title: MoOx thin films deposition by reactive RF-magnetron sputtering
Author: Ramis-Masachs, Mireia
Director: Bertomeu i Balagueró, Joan
Keywords: Molibdè
Cèl·lules solars
Treballs de fi de grau
Molybdenum
Solar cells
Bachelor's thesis
Issue Date: Jan-2018
Abstract: Sub-stoichiometric molybdenum oxide (MoOx, x < 3) thin films are deposited and analyzed to find optimum parameters for its use in heterojunction solar-cells. Deposition is done on n-type crystalline silicon wafer and glass substrates by reactive RF-magnetron sputtering. Oxygen partial pressure and deposition pressure are the two parameters used to vary stoichiometry inflluencing other characteristics. Stoichiometric composition, thickness, electrical properties and optical response have been studied to characterize the deposited thin films. MoOx, as other transition metal oxides, on the n-type silicon wafer act as a hole-selective layer. It is a good way of providing a p+-n junction without using dopant.
Note: Treballs Finals de Grau de Física, Facultat de Física, Universitat de Barcelona, Curs: 2018, Tutor: Joan Bertomeu
URI: http://hdl.handle.net/2445/124577
Appears in Collections:Treballs Finals de Grau (TFG) - Física

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