Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/24307
Title: Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm
Author: Ferré Borrull, Josep
Duparré, Angela
Quesnel, Etienne
Keywords: Dispersió de la llum
Òptica electrònica
Light scattering
Electron optics
Issue Date: 2000
Publisher: Optical Society of America
Abstract: Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.
Note: Reproducció del document publicat a: http://dx.doi.org/10.1364/AO.39.005854
It is part of: Applied Optics, 2000, Vol. 39, Issue 31, pp. 5854-5864
URI: http://hdl.handle.net/2445/24307
ISSN: 0003-6935
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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