Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/32218
Title: Micro-Raman study of stress distribution in local isolation structures and correlation with transmission electron microscopy
Author: De Wolf, I.
Vanhellemont, J.
Romano Rodríguez, Alberto
Norström, H.
Maes, H.E.
Keywords: Pel·lícules fines
Química física
Thin films
Physical and theoretical chemistry
Issue Date: 1992
Publisher: American Institute of Physics
Abstract: Stress in local isolation structures is studied by micro‐Raman spectroscopy. The results are correlated with predictions of an analytical model for the stress distribution and with cross‐sectional transmission electron microscopy observations. The measurements are performed on structures on which the Si3N4 oxidation mask is still present. The influence of the pitch of the periodic local isolation pattern, consisting of parallel lines, the thickness of the mask, and the length of the bird"s beak on the stress distribution are studied. It is found that compressive stress is present in the Si substrate under the center of the oxidation mask lines, with a magnitude dependent on the width of the lines. Large tensile stress is concentrated under the bird"s beak and is found to increase with decreasing length of the bird"s beak and with increasing thickness of the Si3N4 film.
Note: Reproducció del document publicat a: http://dx.doi.org/10.1063/1.351311
It is part of: Journal of Applied Physics, 1992, vol. 71, num. 2, p. 898-906
Related resource: http://dx.doi.org/10.1063/1.351311
URI: http://hdl.handle.net/2445/32218
ISSN: 0021-8979
Appears in Collections:Articles publicats en revistes (Electrònica)

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