Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/33659
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dc.contributor.authorOstos, C.-
dc.contributor.authorRaymond, Oscar-
dc.contributor.authorSuarez-Almodovar, N.-
dc.contributor.authorBueno-Baqués, D.-
dc.contributor.authorMestres i Vila, Ma. Lourdes-
dc.contributor.authorSiqueiros, J. M.-
dc.date.accessioned2013-02-01T08:56:27Z-
dc.date.available2013-02-01T08:56:27Z-
dc.date.issued2011-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/2445/33659-
dc.description.abstractIn this study, (011)-highly oriented Sr, Nb co-doped BiFeO3 (BFO) thin films were successfully grown on SrRuO3/Si substrates by rf-magnetron sputtering. The presence of parasite magnetic phases was ruled out based on the high resolution x-ray diffraction data. BFO films exhibited a columnar-like grain growth with rms surface roughness values of 5.3 nm and average grain sizes of 65-70 nm for samples with different thicknesses. Remanent polarization values (2Pr) of 54 lC cm 2 at room temperature were found for the BFO films with a ferroelectric behavior characteristic of an asymmetric device structure. Analysis of the leakage mechanisms for this structure in negative bias suggests Schottky injection and a dominant Poole-Frenkel trap-limited conduction at room temperature. Oxygen vacancies and Fe3þ/Fe2þ trap centers are consistent with the surface chemical bonding states analysis from x-ray photoelectron spectroscopy data. The (011)-BFO/ SrRuO3/Si film structure exhibits a strong magnetic interaction at the interface between the multiferroic film and the substrate layer where an enhanced ferromagnetic response at 5 K was observed. Zero-field cooled (ZFC) and field cooled (FC) magnetization curves of this film system revealed a possible spin glass behavior at spin freezing temperatures below 30 K depending on the BFO film thickness.-
dc.format.extent8 p.-
dc.format.mimetypeapplication/pdf-
dc.language.isoeng-
dc.publisherAmerican Institute of Physics-
dc.relation.isformatofReproducció del document publicat a: https://doi.org/10.1063/1.3610428-
dc.relation.ispartofJournal of Applied Physics, 2011, vol. 110, p. 024114-1-024114-7-
dc.relation.urihttps://doi.org/10.1063/1.3610428-
dc.rights(c) American Institute of Physics , 2011-
dc.sourceArticles publicats en revistes (Química Inorgànica i Orgànica)-
dc.subject.classificationPel·lícules fines-
dc.subject.classificationFerroelectricitat-
dc.subject.classificationMetall-òxid-semiconductors complementaris-
dc.subject.classificationEspintrònica-
dc.subject.classificationNiobi-
dc.subject.otherThin films-
dc.subject.otherFerroelectricity-
dc.subject.otherComplementary metal oxide semiconductors-
dc.subject.otherSpintronics-
dc.subject.otherNiobium-
dc.titleHighly textured Sr, Nb, co-doped BiFeO3 thin films grown on SrRuO3/Si substrates by rf-sputtering-
dc.typeinfo:eu-repo/semantics/article-
dc.typeinfo:eu-repo/semantics/publishedVersion-
dc.identifier.idgrec607816-
dc.date.updated2013-02-01T08:56:27Z-
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess-
Appears in Collections:Articles publicats en revistes (Química Inorgànica i Orgànica)

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