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Title: Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD
Author: Muñoz, D.
Carreras Seguí, Paz
Escarré i Palou, Jordi
Ibarz, D.
Martín de Nicolás, S.
Voz Sánchez, Cristóbal
Asensi López, José Miguel
Bertomeu i Balagueró, Joan
Keywords: Deposició química en fase vapor
Cèl·lules solars
Teoria quàntica
Propietats òptiques
Chemical vapor deposition
Solar cells
Quantum theory
Optical properties
Issue Date: 2009
Publisher: Elsevier B.V.
Abstract: In this work, we have studied the texturization process of (100) c-Si wafers using a low concentration potassium hydroxide solution in order to obtain good quality textured wafers. The optimization of the etching conditions have led to random but uniform pyramidal structures with good optical properties. Then, symmetric heterojunctions were deposited by Hot-Wire CVD onto these substrates and the Quasi-Steady-State PhotoConductance technique was used to measure passivation quality. Little degradation in the effective lifetime and implicit open circuit voltage of these devices (< 20 mV) was observed in all cases. It is especially remarkable that for big uniform pyramids, the open-circuit voltage is comparable to the values obtained on flat substrates.
Note: Versió postprint del document publicat a:
It is part of: Thin Solid Films, 2009, vol. 517, num. 12, p. 3578-3580
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ISSN: 0040-6090
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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