Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/47284
Title: Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD
Author: Muñoz, D.
Carreras Seguí, Paz
Escarré i Palou, Jordi
Ibarz, D.
Martín de Nicolás, S.
Voz Sánchez, Cristóbal
Asensi López, José Miguel
Bertomeu i Balagueró, Joan
Keywords: Deposició química en fase vapor
Cèl·lules solars
Teoria quàntica
Propietats òptiques
Aiguafort
Chemical vapor deposition
Solar cells
Quantum theory
Optical properties
Etching
Issue Date: 2009
Publisher: Elsevier B.V.
Abstract: In this work, we have studied the texturization process of (100) c-Si wafers using a low concentration potassium hydroxide solution in order to obtain good quality textured wafers. The optimization of the etching conditions have led to random but uniform pyramidal structures with good optical properties. Then, symmetric heterojunctions were deposited by Hot-Wire CVD onto these substrates and the Quasi-Steady-State PhotoConductance technique was used to measure passivation quality. Little degradation in the effective lifetime and implicit open circuit voltage of these devices (< 20 mV) was observed in all cases. It is especially remarkable that for big uniform pyramids, the open-circuit voltage is comparable to the values obtained on flat substrates.
Note: Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2009.01.024
It is part of: Thin Solid Films, 2009, vol. 517, num. 12, p. 3578-3580
Related resource: http://dx.doi.org/10.1016/j.tsf.2009.01.024
URI: http://hdl.handle.net/2445/47284
ISSN: 0040-6090
Appears in Collections:Articles publicats en revistes (Física Aplicada)

Files in This Item:
File Description SizeFormat 
561141.pdf192.66 kBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.