Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/61851
Title: Degradation of thin tungsten filaments at high temperature in HWCVD
Author: Frigeri, Paolo Antonio
Nos Aguilà, Oriol
Bertomeu i Balagueró, Joan
Keywords: Tungstè
Deposició química en fase vapor
Silici
Catàlisi
Pel·lícules fines
Tungsten
Chemical vapor deposition
Silicon
Catalysis
Thin films
Issue Date: 2015
Publisher: Elsevier B.V.
Abstract: The degradation of the filaments is usually studied by checking the silicidation or carbonization status of the refractory metal used as catalysts, and their effects on the structural stability of the filaments. In this paper, it will be shown that the catalytic stability of a filament heated at high temperature is much shorter than its structural lifetime. The electrical resistance of a thin tungsten filament and the deposition rate of the deposited thin film have been monitored during the filament aging. It has been found that the deposition rate drops drastically once the quantity of dissolved silicon in the tungsten reaches the solubility limit and the silicides start precipitating. This manuscript concludes that the catalytic stability is only guaranteed for a short time and that for sufficiently thick filaments it does not depend on the filament radius.
Note: Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2014.10.011
It is part of: Thin Solid Films, 2015, vol. 575, p. 34-37
Related resource: http://dx.doi.org/10.1016/j.tsf.2014.10.011
URI: http://hdl.handle.net/2445/61851
ISSN: 0040-6090
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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