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Title: The role of hydrogen in the formation of microcrystalline silicon
Author: Fontcuberta i Morral, A.
Bertomeu i Balagueró, Joan
Roca i Cabarrocas, P. (Pere)
Keywords: Silici
Temperatures baixes
Pel·lícules fines
Low temperatures
Thin films
Issue Date: 2000
Publisher: Elsevier B.V.
Abstract: The growth mechanisms of microcrystalline silicon thin films at low temperatures (100-250°C) by plasma CVD are still a matter of debate. We have shown that ue-Si:H formation proceeds through four phases (incubation, nucleation, growth and steady state) and that hydrogen plays a key role in this process, particularly during the incubation phase in which hydrogen modifies the amorphous silicon network and forms a highly porous phase where nucleation takes place. In this study we combine in-situ ellipsometry and dark conductivity measurements with ex-situ high resolution transmission electron microscopy to improve our understanding of microcrystalline silicon formation.
Note: Versió postprint del document publicat a:
It is part of: Materials Science and Engineering B-Solid State Materials for Advanced Technology, 2000, vol. 69-70, p. 559-563
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ISSN: 0921-5107
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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