Please use this identifier to cite or link to this item:
http://hdl.handle.net/2445/174711
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DC Field | Value | Language |
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dc.contributor.author | Toulouse, Constance | - |
dc.contributor.author | Fischer, J. | - |
dc.contributor.author | Farokhipoor, S. | - |
dc.contributor.author | Yedra Cardona, Lluís | - |
dc.contributor.author | Carlá, Francesco | - |
dc.contributor.author | Jarnac, A. | - |
dc.contributor.author | Elkaim, E. | - |
dc.contributor.author | Fertey, P. | - |
dc.contributor.author | Audinot, J.-N. | - |
dc.contributor.author | Wirtz, Tom | - |
dc.contributor.author | Noheda, B. | - |
dc.contributor.author | Garcia, V. | - |
dc.contributor.author | Fusil, S. | - |
dc.contributor.author | Peral Alonso, I. | - |
dc.contributor.author | Guennou, M. | - |
dc.contributor.author | Kreisel, J. | - |
dc.date.accessioned | 2021-03-05T11:28:43Z | - |
dc.date.available | 2021-03-05T11:28:43Z | - |
dc.date.issued | 2021-02-09 | - |
dc.identifier.issn | 2475-9953 | - |
dc.identifier.uri | http://hdl.handle.net/2445/174711 | - |
dc.description.abstract | Helium implantation in epitaxial thin films is a way to control the out-of-plane deformation independentlyfrom the in-plane strain controlled by epitaxy. In particular, implantation by means of a helium microscopeallows for local implantation and patterning down to the nanometer resolution, which is of interest for deviceapplications. We present here a study of bismuth ferrite (BiFeO3) films where strain was patterned locally byhelium implantation. Our combined Raman, x-ray diffraction, and transmission electron microscopy (TEM)study shows that the implantation causes an elongation of the BiFeO3unit cell and ultimately a transition towardsthe so-called supertetragonal polymorph via states with mixed phases. In addition, TEM reveals the onset ofamorphization at a threshold dose that does not seem to impede the overall increase in tetragonality. The phasetransition from the R-like to T-like BiFeO3appears as first-order in character, with regions of phase coexistenceand abrupt changes in lattice parameters. | - |
dc.format.extent | 9 p. | - |
dc.format.mimetype | application/pdf | - |
dc.language.iso | eng | - |
dc.publisher | American Physical Society | - |
dc.relation.isformatof | Reproducció del document publicat a: https://doi.org/10.1103/PhysRevMaterials.5.024404 | - |
dc.relation.ispartof | Physical Review Materials, 2021, vol. 5, num. 2, p. 024404 | - |
dc.relation.uri | https://doi.org/10.1103/PhysRevMaterials.5.024404 | - |
dc.rights | (c) American Physical Society, 2021 | - |
dc.source | Articles publicats en revistes (Enginyeria Electrònica i Biomèdica) | - |
dc.subject.classification | Pel·lícules fines | - |
dc.subject.classification | Heli | - |
dc.subject.other | Thin films | - |
dc.subject.other | Helium | - |
dc.title | Patterning enhanced tetragonality in BiFeO3 thin films with effective negative pressure by helium implantation | - |
dc.type | info:eu-repo/semantics/article | - |
dc.type | info:eu-repo/semantics/publishedVersion | - |
dc.identifier.idgrec | 707667 | - |
dc.date.updated | 2021-03-05T11:28:44Z | - |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | - |
Appears in Collections: | Articles publicats en revistes (Enginyeria Electrònica i Biomèdica) |
Files in This Item:
File | Description | Size | Format | |
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707667.pdf | 3.01 MB | Adobe PDF | View/Open |
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