Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/193677
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dc.contributor.authorAndrada Chacon, Adrian-
dc.contributor.authorMorales Garcia, Angel-
dc.contributor.authorSalvado, Miguel A.-
dc.contributor.authorPertierra, Pilar-
dc.contributor.authorFranco, Ruth-
dc.contributor.authorGarbarino, Gaston-
dc.contributor.authorTaravillo, Mercedes-
dc.contributor.authorBarreda Argueso, Jose A.-
dc.contributor.authorGonzalez, Jesus-
dc.contributor.authorBaonza, Valentin Garcia-
dc.contributor.authorRecio, J. Manuel-
dc.contributor.authorSanchez-Benitez, Javier-
dc.date.accessioned2023-02-15T11:27:34Z-
dc.date.available2023-02-15T11:27:34Z-
dc.date.issued2021-02-01-
dc.identifier.issn0020-1669-
dc.identifier.urihttp://hdl.handle.net/2445/193677-
dc.description.abstractThe quest for new transition metal dichalcogenides (TMDs) with outstanding electronic properties operating at ambient conditions draws us to investigate the 1T-HfSe2 polytype under hydrostatic pressure. Diamond anvil cell (DAC) devices coupled to in- situ synchrotron X-ray, Raman and optical (VIS-NIR) absorption experiments along with density functional theory (DFT) based calculations prove that: (i) bulk 1T-HfSe2 exhibits strong structural and vibrational anisotropies, being the interlayer direction especially sensitive to pressure changes, (ii) the indirect gap of 1T-HfSe2 trend to vanish by a -0.1 eV/GPa pressure rate, slightly faster than MoS2 or WS2, (iii) the onset of the metallic behavior appears at Pmet ~10 GPa, which is to date the lowest pressure among common TMDs, and finally (iv) the electronic transition is explained by the bulk modulus B0-Pmet correlation, along with the pressure coefficient of the band gap, in terms of the electronic overlap between chalcogenide p-type and metal d-type orbitals.-
dc.format.extent25 p.-
dc.format.mimetypeapplication/pdf-
dc.language.isoeng-
dc.publisherAmerican Chemical Society-
dc.relation.isformatofVersió postprint del document publicat a: https://doi.org/10.1021/acs.inorgchem.0c03223-
dc.relation.ispartofInorganic Chemistry, 2021, vol. 60, num. 3, p. 1746-1754-
dc.relation.urihttps://doi.org/10.1021/acs.inorgchem.0c03223-
dc.rights(c) American Chemical Society , 2021-
dc.sourceArticles publicats en revistes (Ciència dels Materials i Química Física)-
dc.subject.classificationMaterials-
dc.subject.classificationQuímica física-
dc.subject.otherMaterials-
dc.subject.otherPhysical and theoretical chemistry-
dc.titlePressure-Driven Metallization in Hafnium Diselenide-
dc.typeinfo:eu-repo/semantics/article-
dc.typeinfo:eu-repo/semantics/acceptedVersion-
dc.identifier.idgrec714152-
dc.date.updated2023-02-15T11:27:34Z-
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess-
Appears in Collections:Articles publicats en revistes (Ciència dels Materials i Química Física)

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