Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/24307
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dc.contributor.authorFerré Borrull, Josepcat
dc.contributor.authorDuparré, Angelacat
dc.contributor.authorQuesnel, Etiennecat
dc.date.accessioned2012-04-23T07:03:47Z-
dc.date.available2012-04-23T07:03:47Z-
dc.date.issued2000-
dc.identifier.issn0003-6935-
dc.identifier.urihttp://hdl.handle.net/2445/24307-
dc.description.abstractScattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.eng
dc.format.extent11 p.-
dc.format.mimetypeapplication/pdf-
dc.language.isoengeng
dc.publisherOptical Society of America-
dc.relation.isformatofReproducció del document publicat a: http://dx.doi.org/10.1364/AO.39.005854-
dc.relation.ispartofApplied Optics, 2000, Vol. 39, Issue 31, pp. 5854-5864-
dc.relation.urihttp://dx.doi.org/10.1364/AO.39.005854-
dc.rights(c) Optical Society of America, 2000-
dc.sourceArticles publicats en revistes (Física Aplicada)-
dc.subject.classificationDispersió de la llumcat
dc.subject.classificationÒptica electrònicacat
dc.subject.otherLight scatteringeng
dc.subject.otherElectron opticseng
dc.titleRoughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm-
dc.typeinfo:eu-repo/semantics/article-
dc.typeinfo:eu-repo/semantics/publishedVersion-
dc.identifier.idgrec194020-
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess-
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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