Please use this identifier to cite or link to this item:
https://hdl.handle.net/2445/25086
Title: | Nanoscale capacitance microscopy of thin dielectric films |
Author: | Gomila Lluch, Gabriel Toset Gilabert, Jorge Fumagalli, Laura, 1959- |
Keywords: | Dielèctrics Nanotecnologia Dielectrics Nanotechnology |
Issue Date: | 25-Jul-2008 |
Publisher: | American Institute of Physics |
Abstract: | We present an analytical model to interpret nanoscale capacitance microscopy measurements on thin dielectric films. The model displays a logarithmic dependence on the tip-sample distance and on the film thickness-dielectric constant ratio and shows an excellent agreement with finite-element numerical simulations and experimental results on a broad range of values. Based on these results, we discuss the capabilities of nanoscale capacitance microscopy for the quantitative extraction of the dielectric constant and the thickness of thin dielectric films at the nanoscale. |
Note: | Reproducció del document publicat a: http://dx.doi.org/10.1063/1.2957069 |
It is part of: | Journal of Applied Physics, 2008, vol. 104, núm. 2, p. 024315 |
URI: | https://hdl.handle.net/2445/25086 |
Related resource: | http://dx.doi.org/10.1063/1.2957069 |
ISSN: | 0021-8979 |
Appears in Collections: | Articles publicats en revistes (Enginyeria Electrònica i Biomèdica) Articles publicats en revistes (Institut de Bioenginyeria de Catalunya (IBEC)) |
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File | Description | Size | Format | |
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561608.pdf | 513.25 kB | Adobe PDF | View/Open |
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