Please use this identifier to cite or link to this item:
https://hdl.handle.net/2445/61845
Title: | Technological solution for the automatic replacement of the catalytic filaments in HWCVD |
Author: | Nos Aguilà, Oriol Frigeri, Paolo Antonio Bertomeu i Balagueró, Joan |
Keywords: | Deposició química en fase vapor Silici Catàlisi Pel·lícules fines Chemical vapor deposition Silicon Catalysis Thin films |
Issue Date: | 30-Jan-2015 |
Publisher: | Elsevier |
Abstract: | The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions. |
Note: | Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2014.10.010 |
It is part of: | Thin Solid Films, 2015, vol. 575, p. 30-33 |
URI: | https://hdl.handle.net/2445/61845 |
Related resource: | http://dx.doi.org/10.1016/j.tsf.2014.10.010 |
ISSN: | 0040-6090 |
Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
Files in This Item:
File | Description | Size | Format | |
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644000.pdf | 290.17 kB | Adobe PDF | View/Open |
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