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Issue Date | Title | Author(s) |
---|---|---|
30-Nov-2016 | Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers | García-Valenzuela, Jorge A.; Rivera, R.; Morales-Vilches, A. B.; Gerling-Sarabia, L. G.; Caballero, A.; Asensi López, José Miguel; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |