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Title: | Hot wire chemical vapor deposition: limits and opportunities of protecting the tungsten catalyzer from silicide with a cavity |
Author: | Frigeri, Paolo Antonio Nos Aguilà, Oriol Bengoechea, S. Frevert, C. Asensi López, José Miguel Bertomeu i Balagueró, Joan |
Keywords: | Tungstè Cèl·lules solars Deposició en fase de vapor Silici Tungsten Solar cells Vapor-plating Silicon |
Issue Date: | 22-Jan-2009 |
Publisher: | Elsevier B.V. |
Abstract: | Hot Wire Chemical Vapor Deposition (HW-CVD) is one of the most promising techniques for depositing the intrinsic microcrystalline silicon layer for the production of micro-morph solar cells. However, the silicide formation at the colder ends of the tungsten wire drastically reduces the lifetime of the catalyzer, thus limiting its industrial exploitation. A simple but interesting strategy to decrease the silicide formation is to hide the electrical contacts of the catalyzer in a long narrow cavity which reduces the probability of the silane molecules to reach the colder ends of the wire. In this paper, the working mechanism of the cavity is elucidated. Measurements of the thickness profile of the silicon deposited in the internal walls of the cavity have been compared with those predicted using a simple diffusion model based on the assumption of Knudsen flow. A lifetime study of the protected and unprotected wires has been carried out. The different mechanisms which determine the deterioration of the catalyzer have been identified and discussed. |
Note: | Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2009.01.023 |
It is part of: | Thin Solid Films, 2009, vol. 517, num. 12, p. 3427-3430 |
URI: | http://hdl.handle.net/2445/98047 |
Related resource: | http://dx.doi.org/10.1016/j.tsf.2009.01.023 |
ISSN: | 0040-6090 |
Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
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