# name
Excimer laser induced deposition of copper from Cu(hfac)(TMVS)

# metadata.dc.description.abstract[].value
Copper films have been deposited on TiN and fluoropolymer substrates from the KrF excimer-laser-assisted decomposition of Cu(hfac)(TMVS). Using H2 as the carrier gas, very uniform, shiny metal-like films were deposited with grain size of 50 to 100 nm. XPS measurements show that the precursor is reduced to metallic copper, and that a Cu/C atomic ratio of up to 17 is obtained.

# metadata.dc.source[].value
Articles publicats en revistes (Física Aplicada)

# metadata.dc.title[].value
Excimer laser induced deposition of copper from Cu(hfac)(TMVS)