Corbella Roca, CarlesRubio Roy, MiguelBertrán Serra, EnricAndújar Bella, José Luis2012-05-072012-05-072009-08-050021-8979https://hdl.handle.net/2445/24963Here we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH4) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 μs. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stoc...11 p.application/pdfeng(c) American Institute of Physics, 2009MetàElectronsPel·lícules finesRevestiments protectorsAplicacions industrialsPlasma (Gasos ionitzats)MethaneElectronsThin filmsProtective coatingsIndustrial applicationsPlasma (Ionized gases)Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon filmsinfo:eu-repo/semantics/article574678info:eu-repo/semantics/openAccess