Orpella, AlbertVoz Sánchez, CristóbalPuigdollers i González, JoaquimDosev, D.Fonrodona Turon, MartaSoler Vilamitjana, DavidBertomeu i Balagueró, JoanAsensi López, José MiguelAndreu i Batallé, JordiAlcubilla González, Ramón2013-10-292013-10-2920010040-6090https://hdl.handle.net/2445/47378Hydrogenated nanocrystalline silicon thin-films were obtained by catalytic chemical vapour deposition at low substrate temperatures (150°C) and high deposition rates (10 Å/s). These films, with crystalline fractions over 90%, were incorporated as the active layers of bottom-gate thin-film transistors. The initial field-effect mobilities of these devices were over 0.5 cm 2/V s and the threshold voltages lower than 4 V. In this work, we report on the enhanced stability of these devices under prolonged times of gate bias stress compared to amorphous silicon thin-film transistors. Hence, they are promising candidates to be considered in the future for applications such as flat-panel displays.11 p.application/pdfeng(c) Elsevier B.V., 2001Pel·lícules finesSiliciNanocristallsSemiconductorsCatàlisiDeposició química en fase vaporThin filmsSiliconNanocrystalsSemiconductorsCatalysisChemical vapor depositioninfo:eu-repo/semantics/article1713292013-10-29info:eu-repo/semantics/openAccess