Izquierdo, RicardoBertomeu i Balagueró, JoanSuys, MarcSacher, EdwardMeunier, Michel2016-05-232016-05-2319950169-4332https://hdl.handle.net/2445/98759Copper films have been deposited on TiN and fluoropolymer substrates from the KrF excimer-laser-assisted decomposition of Cu(hfac)(TMVS). Using H2 as the carrier gas, very uniform, shiny metal-like films were deposited with grain size of 50 to 100 nm. XPS measurements show that the precursor is reduced to metallic copper, and that a Cu/C atomic ratio of up to 17 is obtained.5 p.application/pdfeng(c) Elsevier B.V., 1995CoureLàsersPel·lícules metàl·liquesCopperLasersMetallic filmsinfo:eu-repo/semantics/article1143752016-05-12info:eu-repo/semantics/openAccess