Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/127307
Title: Electron beam lithography for contacting single nanowires on non-flat suspended substrates
Author: Samà Monsonís, Jordi
Domènech Gil, Guillem
Gracia, Isabel
Borrisé, Xavier
Cané i Ballart, Carles
Barth, Sven
Steib, Frederik
Waag, Andreas
Prades García, Juan Daniel
Romano Rodríguez, Albert
Keywords: Detectors de gasos
Feixos electrònics
Nanoestructures
Gas detectors
Electron beams
Nanostructures
Issue Date: 9-Jan-2019
Publisher: Elsevier B.V.
Abstract: A methodology based on the use of Electron Beam Lithography for contacting individual nanowires on top of non-flat micromembranes and microhotplates has been implemented, and the practical details have been exhaustively described. The different fabrication steps have been adapted to the substrate's topology, requiring specific holders and conditions. The methodology is demonstrated on individual SnO2 nanowires, which, after fabrication, have been characterized as functional resistive gas nanosensors towards NH3 and benchmarked against similar devices fabricated using more conventional Dual Beam Focused Ion Beam techniques, demonstrating the superior properties of the here presented methodology, which can be further extended to other non-conventional suspended substrates and nanomaterials.
Note: Versió postprint del document publicat a: https://doi.org/10.1016/j.snb.2019.01.040
It is part of: Sensors and Actuators B-Chemical, 2019, vol. 286, p. 616-623
URI: http://hdl.handle.net/2445/127307
Related resource: https://doi.org/10.1016/j.snb.2019.01.040
ISSN: 0925-4005
Appears in Collections:Articles publicats en revistes (Enginyeria Electrònica i Biomèdica)
Publicacions de projectes de recerca finançats per la UE

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