Please use this identifier to cite or link to this item:
http://hdl.handle.net/2445/22088
Title: | Ni-Mn-Ga thin films produced by pulsed laser deposition |
Author: | Tello, P. G. Castaño, F. J. O'Handley, Robert C., 1942- Allen, Samuel M. Esteve, M. Labarta, Amílcar Batlle Gelabert, Xavier |
Keywords: | Pel·lícules fines Cristal·lografia Ciència dels materials Làsers Microelectrònica Crystallography Materials science Lasers Microelectronics |
Issue Date: | 2002 |
Publisher: | American Institute of Physics |
Abstract: | Polycrystalline Ni-Mn-Ga thin films have been deposited by the pulsed laser deposition (PLD) technique, using slices of a Ni-Mn-Ga single crystal as targets and onto Si (100) substrates at temperatures ranging from 673 K up to 973 K. Off-stoichiometry thin films were deposited at a base pressure of 1×10-6-Torr or in a 5 mTorr Ar atmosphere. Samples deposited in vacuum and temperatures above 823 K are magnetic at room temperature and show the austenitic {220} reflection in their x-ray diffraction patterns. The temperature dependences of both electrical resistance and magnetic susceptibility suggest that these samples exhibit a structural martensitic transition at around 260 K. The magnetoresistance ratio at low temperature can be as high as 1.3%, suggesting the existence of a granular structure in the films |
Note: | Reproducció del document publicat a: http://dx.doi.org/10.1063/1.1452222 |
It is part of: | Journal of Applied Physics, 2002, vol. 91, núm. 10, p. 8234-8236 |
URI: | http://hdl.handle.net/2445/22088 |
Related resource: | http://dx.doi.org/10.1063/1.1452222 |
ISSN: | 0021-8979 |
Appears in Collections: | Articles publicats en revistes (Física de la Matèria Condensada) |
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