Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/22090
Title: Quantitative x-ray photoelectron spectroscopy study of Al/AlOx bilayers
Author: Batlle Gelabert, Xavier
Hattink, Bart Jan
Labarta, Amílcar
Åkerman, Johan J.
Escudero, Roberto
Schuller, Ivan K.
Keywords: Espectroscòpia de raigs X
Fotoelectrons
Espectroscòpia d'electrons
Materials magnètics
Photoelectrons
Electron spectroscopy
Magnetic materials
Issue Date: 2002
Publisher: American Institute of Physics
Abstract: An x-ray photoelectron spectroscopy (XPS) analysis of Nb/Al wedge bilayers, oxidized by both plasma and natural oxidation, is reported. The main goal is to show that the oxidation state¿i.e., O:(oxidize)Al ratio¿, structure and thickness of the surface oxide layer, as well as the thickness of the metallic Al leftover, as functions of the oxidation procedure, can be quantitatively evaluated from the XPS spectra. This is relevant to the detailed characterization of the insulating barriers in (magnetic) tunnel junctions
Note: Reproducció del document publicat a: http://dx.doi.org/10.1063/1.1478791
It is part of: Journal of Applied Physics, 2002, vol. 91, núm. 12, p. 10163-10168
URI: http://hdl.handle.net/2445/22090
ISSN: 0021-8979
Appears in Collections:Articles publicats en revistes (Física de la Matèria Condensada)

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