Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/24963
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dc.contributor.authorCorbella Roca, Carlescat
dc.contributor.authorRubio Roy, Miguelcat
dc.contributor.authorBertrán Serra, Enriccat
dc.contributor.authorAndújar Bella, José Luiscat
dc.date.accessioned2012-05-07T06:44:53Z-
dc.date.available2012-05-07T06:44:53Z-
dc.date.issued2009-08-05-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/2445/24963-
dc.description.abstractHere we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH4) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 μs. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stoc...-
dc.format.extent11 p.-
dc.format.mimetypeapplication/pdf-
dc.language.isoeng-
dc.publisherAmerican Institute of Physics-
dc.relation.isformatofReproducció del document publicat a: http://dx.doi.org/10.1063/1.3183945-
dc.relation.ispartofJournal of Applied Physics, 2009, vol. 106, núm. 3, p. 033302-
dc.relation.urihttp://dx.doi.org/10.1063/1.3183945-
dc.rights(c) American Institute of Physics, 2009-
dc.sourceArticles publicats en revistes (Física Aplicada)-
dc.subject.classificationMetàcat
dc.subject.classificationElectronscat
dc.subject.classificationPel·lícules finescat
dc.subject.classificationRevestiments protectorscat
dc.subject.classificationAplicacions industrialscat
dc.subject.classificationPlasma (Gasos ionitzats)cat
dc.subject.otherMethaneeng
dc.subject.otherElectronseng
dc.subject.otherThin filmseng
dc.subject.otherProtective coatingseng
dc.subject.otherIndustrial applicationseng
dc.subject.otherPlasma (Ionized gases)eng
dc.titlePlasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon filmseng
dc.typeinfo:eu-repo/semantics/article-
dc.typeinfo:eu-repo/semantics/publishedVersion-
dc.identifier.idgrec574678-
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess-
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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