Please use this identifier to cite or link to this item:
http://hdl.handle.net/2445/24963
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Corbella Roca, Carles | cat |
dc.contributor.author | Rubio Roy, Miguel | cat |
dc.contributor.author | Bertrán Serra, Enric | cat |
dc.contributor.author | Andújar Bella, José Luis | cat |
dc.date.accessioned | 2012-05-07T06:44:53Z | - |
dc.date.available | 2012-05-07T06:44:53Z | - |
dc.date.issued | 2009-08-05 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.uri | http://hdl.handle.net/2445/24963 | - |
dc.description.abstract | Here we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH4) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 μs. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stoc... | - |
dc.format.extent | 11 p. | - |
dc.format.mimetype | application/pdf | - |
dc.language.iso | eng | - |
dc.publisher | American Institute of Physics | - |
dc.relation.isformatof | Reproducció del document publicat a: http://dx.doi.org/10.1063/1.3183945 | - |
dc.relation.ispartof | Journal of Applied Physics, 2009, vol. 106, núm. 3, p. 033302 | - |
dc.relation.uri | http://dx.doi.org/10.1063/1.3183945 | - |
dc.rights | (c) American Institute of Physics, 2009 | - |
dc.source | Articles publicats en revistes (Física Aplicada) | - |
dc.subject.classification | Metà | cat |
dc.subject.classification | Electrons | cat |
dc.subject.classification | Pel·lícules fines | cat |
dc.subject.classification | Revestiments protectors | cat |
dc.subject.classification | Aplicacions industrials | cat |
dc.subject.classification | Plasma (Gasos ionitzats) | cat |
dc.subject.other | Methane | eng |
dc.subject.other | Electrons | eng |
dc.subject.other | Thin films | eng |
dc.subject.other | Protective coatings | eng |
dc.subject.other | Industrial applications | eng |
dc.subject.other | Plasma (Ionized gases) | eng |
dc.title | Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films | eng |
dc.type | info:eu-repo/semantics/article | - |
dc.type | info:eu-repo/semantics/publishedVersion | - |
dc.identifier.idgrec | 574678 | - |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | - |
Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
574678.pdf | 377.55 kB | Adobe PDF | View/Open |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.