Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/24984
Title: Computer-aided procedure for optimization of layer thickness uniformity in thermal evaporation physical vapor deposition chambers for lens coating
Author: Bosch i Puig, Salvador
Keywords: Disseny assistit per ordinador
Pel·lícules fines
Filtres òptics
Lents
Computer-aided design
Thin films
Light filters
Lenses
Issue Date: Jan-1992
Publisher: American Institute of Physics
Abstract: A computer-aided method to improve the thickness uniformity attainable when coating multiple substrates inside a thermal evaporation physical vapor deposition unit is presented. The study is developed for the classical spherical (dome-shaped) calotte and also for a plane sector reversible holder setup. This second arrangement is very useful for coating both sides of the substrate, such as antireflection multilayers on lenses. The design of static correcting shutters for both kinds of configurations is also discussed. Some results of using the method are presented as an illustration.
Note: Reproducció del document publicat a: http://dx.doi.org/10.1116/1.578073
It is part of: Journal of Vacuum Science Technology A-Vacuum Surfaces and Films, vol. 10, núm. 1, pag. 98-104
Related resource: http://dx.doi.org/10.1116/1.578073
URI: http://hdl.handle.net/2445/24984
ISSN: 0734-2101
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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