Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/25462
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dc.contributor.authorAnopchenko, Alekseicat
dc.contributor.authorTengattini, Andreacat
dc.contributor.authorMarconi, Alessandrocat
dc.contributor.authorPrtljaga, Nikolacat
dc.contributor.authorRamírez Ramírez, Joan Manelcat
dc.contributor.authorJambois, Oliviercat
dc.contributor.authorBerencén Ramírez, Yonder Antoniocat
dc.contributor.authorNavarro Urrios, Danielcat
dc.contributor.authorGarrido Fernández, Blascat
dc.contributor.authorMilesi, F.cat
dc.contributor.authorColonna, Jean-Philippecat
dc.contributor.authorFedeli, Jean-Marccat
dc.contributor.authorPavesi, Lorenzocat
dc.date.accessioned2012-05-11T11:19:46Z-
dc.date.available2012-05-11T11:19:46Z-
dc.date.issued2012-03-21-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/2445/25462-
dc.description.abstractHigh quantum efficiency erbium doped silicon nanocluster (Si-NC:Er) light emitting diodes (LEDs) were grown by low-pressure chemical vapor deposition (LPCVD) in a complementary metal-oxide-semiconductor (CMOS) line. Erbium (Er) excitation mechanisms under direct current (DC) and bipolar pulsed electrical injection were studied in a broad range of excitation voltages and frequencies. Under DC excitation, Fowler-Nordheim tunneling of electrons is mediated by Er-related trap states and electroluminescence originates from impact excitation of Er ions. When the bipolar pulsed electrical injection is used, the electron transport and Er excitation mechanism change. Sequential injection of electrons and holes into silicon nanoclusters takes place and nonradiative energy transfer to Er ions is observed. This mechanism occurs in a range of lower driving voltages than those observed in DC and injection frequencies higher than the Er emission rate.eng
dc.format.extent5 p.-
dc.format.mimetypeapplication/pdf-
dc.language.isoengeng
dc.publisherAmerican Institute of Physics-
dc.relation.isformatofReproducció del document publicat a: http://dx.doi.org/10.1063/1.3694680cat
dc.relation.ispartofJournal of Applied Physics, 2012, vol. 111, núm. 6, p. 063102-1-063102-5-
dc.relation.urihttp://dx.doi.org/10.1063/1.3694680-
dc.rights(c) American Institute of Physics, 2012-
dc.sourceArticles publicats en revistes (Enginyeria Electrònica i Biomèdica)-
dc.subject.classificationFotònicacat
dc.subject.classificationÒptica integradacat
dc.subject.otherPhotonicseng
dc.subject.otherIntegrated opticseng
dc.titleBipolar pulsed excitation of erbium-doped nanosilicon light emitting diodeseng
dc.typeinfo:eu-repo/semantics/article-
dc.typeinfo:eu-repo/semantics/publishedVersion-
dc.identifier.idgrec600585-
dc.relation.projectIDinfo:eu-repo/grantAgreement/EC/FP7/224312/EU//HELIOS-
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess-
Appears in Collections:Articles publicats en revistes (Enginyeria Electrònica i Biomèdica)
Publicacions de projectes de recerca finançats per la UE

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