Please use this identifier to cite or link to this item:
http://hdl.handle.net/2445/28443
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Prtljaga, Nikola | - |
dc.contributor.author | Navarro Urrios, Daniel | - |
dc.contributor.author | Pitanti, Alessandro | - |
dc.contributor.author | Ferrarese Lupi, Federico | - |
dc.contributor.author | Garrido Fernández, Blas | - |
dc.contributor.author | Pavesi, Lorenzo | - |
dc.date.accessioned | 2012-07-05T09:09:18Z | - |
dc.date.available | 2012-07-05T09:09:18Z | - |
dc.date.issued | 2012-05-10 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.uri | http://hdl.handle.net/2445/28443 | - |
dc.description.abstract | The sensitizing action of amorphous silicon nanoclusters on erbium ions in thin silica films has been studied under low-energy (long wavelength) optical excitation. Profound differences in fast visible and infrared emission dynamics have been found with respect to the high-energy (short wavelength) case. These findings point out to a strong dependence of the energy transfer process on the optical excitation energy. Total inhibition of energy transfer to erbium states higher than the first excited state (4I13/2) has been demonstrated for excitation energy below 1.82 eV (excitation wavelength longer than 680 nm). Direct excitation of erbium ions to the first excited state (4I13/2) has been confirmed to be the dominant energy transfer mechanism over the whole spectral range of optical excitation used (540 nm¿680 nm). | eng |
dc.format.extent | 5 p. | - |
dc.format.mimetype | application/pdf | - |
dc.language.iso | eng | eng |
dc.publisher | American Institute of Physics | - |
dc.relation.isformatof | Reproducció del document publicat a: http://dx.doi.org/10.1063/1.4712626 | cat |
dc.relation.ispartof | Journal of Applied Physics, 2012, vol. 111, núm. 9, p. 094314 | - |
dc.relation.uri | http://dx.doi.org/10.1063/1.4712626 | - |
dc.rights | (c) American Institute of Physics, 2012 | - |
dc.source | Articles publicats en revistes (Enginyeria Electrònica i Biomèdica) | - |
dc.subject.classification | Fotònica | cat |
dc.subject.classification | Silici | cat |
dc.subject.classification | Nanocristalls | cat |
dc.subject.other | Photonics | eng |
dc.subject.other | Silicon | eng |
dc.subject.other | Nanocrystals | eng |
dc.title | Silicon nanocluster sensitization of erbium ions under low-energy optical excitation | eng |
dc.type | info:eu-repo/semantics/article | eng |
dc.type | info:eu-repo/semantics/publishedVersion | - |
dc.relation.projectID | info:eu-repo/grantAgreement/EC/FP7/224312/EU//HELIOS | eng |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | eng |
Appears in Collections: | Articles publicats en revistes (Enginyeria Electrònica i Biomèdica) Publicacions de projectes de recerca finançats per la UE |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
FP7_Helios_garrido.pdf | 699.98 kB | Adobe PDF | View/Open |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.