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Issue Date | Title | Author(s) |
---|---|---|
7-Jan-2013 | HWCVD Technology Development Addressed to the High Rate Deposition of mi-c-Si:H | Nos Aguilà, Oriol |
19-Jul-1993 | Espectrometría de masas de iones secundarios: aportaciones a la técnica y caracterización de capas finas de a-C:H y de a-Si:H | López Fernández, Francisco |
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