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http://hdl.handle.net/2445/47154
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DC Field | Value | Language |
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dc.contributor.author | Frigeri, Paolo Antonio | - |
dc.contributor.author | Nos Aguilà, Oriol | - |
dc.contributor.author | Calvo, J. D. | - |
dc.contributor.author | Carreras Seguí, Paz | - |
dc.contributor.author | Roldán Molinero, Rubén | - |
dc.contributor.author | Antony, Aldrin | - |
dc.contributor.author | Asensi López, José Miguel | - |
dc.contributor.author | Bertomeu i Balagueró, Joan | - |
dc.date.accessioned | 2013-10-18T11:43:48Z | - |
dc.date.available | 2019-11-01T06:10:12Z | - |
dc.date.issued | 2010 | - |
dc.identifier.issn | 1862-6351 | - |
dc.identifier.uri | http://hdl.handle.net/2445/47154 | - |
dc.description.abstract | The scaling up of the Hot Wire Chemical Vapor Deposition (HW-CVD) technique to large deposition area can be done using a catalytic net of equal spaced parallel filaments. The large area deposition limit is defined as the limit whenever a further increment of the catalytic net area does not affect the properties of the deposited film. This is the case when a dense catalytic net is spread on a surface considerably larger than that of the film substrate. To study this limit, a system able to hold a net of twelve wires covering a surface of about 20 cm x 20 cm was used to deposit amorphous (a-Si:H) and microcrystalline (μc-Si:H) silicon over a substrate of 10 cm x 10 cm placed at a filament-substrate distance ranging from 1 to 2 cm. The uniformity of the film thickness d and optical constants, n(x, λ) and α(x,¯hω), was studied via transmission measurements. The thin film uniformity as a function of the filament-substrate distance was studied. The experimental thickness profile was compared with the theoretical result obtained solving the diffusion equations. The optimization of the filament-substrate distance allowed obtaining films with inhomogeneities lower than ±2.5% and deposition rates higher than 1 nm/s and 4.5 nm/s for (μc-Si:H) and (a-Si:H), respectively. | - |
dc.format.extent | 4 p. | - |
dc.format.mimetype | application/pdf | - |
dc.language.iso | eng | - |
dc.publisher | Wiley-VCH | - |
dc.relation.isformatof | Versió preprint del document publicat a: http://dx.doi.org/10.1002/pssc.200982827 | - |
dc.relation.ispartof | physica status solidi (c), 2010, vol. 7, num. 3-4, p. 588-591 | - |
dc.relation.uri | http://dx.doi.org/10.1002/pssc.200982827 | - |
dc.rights | (c) Wiley-VCH, 2010 | - |
dc.source | Articles publicats en revistes (Física Aplicada) | - |
dc.subject.classification | Cèl·lules solars | - |
dc.subject.classification | Deposició química en fase vapor | - |
dc.subject.classification | Silici | - |
dc.subject.classification | Pel·lícules fines | - |
dc.subject.other | Solar cells | - |
dc.subject.other | Chemical vapor deposition | - |
dc.subject.other | Silicon | - |
dc.subject.other | Thin films | - |
dc.title | Uniformity Study of Amorphous and Microcrystalline Silicon Thin Films Deposited on 10cmx10cm Glass Substrate using Hot Wire CVD Technique | eng |
dc.type | info:eu-repo/semantics/article | - |
dc.type | info:eu-repo/semantics/submittedVersion | - |
dc.identifier.idgrec | 574339 | - |
dc.date.updated | 2013-10-18T11:29:34Z | - |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | - |
Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
Files in This Item:
File | Description | Size | Format | |
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574339.pdf | 898.6 kB | Adobe PDF | View/Open |
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