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http://hdl.handle.net/2445/47380
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DC Field | Value | Language |
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dc.contributor.author | Soler Vilamitjana, David | - |
dc.contributor.author | Fonrodona Turon, Marta | - |
dc.contributor.author | Voz Sánchez, Cristóbal | - |
dc.contributor.author | Bertomeu i Balagueró, Joan | - |
dc.contributor.author | Andreu i Batallé, Jordi | - |
dc.date.accessioned | 2013-10-29T15:26:05Z | - |
dc.date.available | 2013-10-29T15:26:05Z | - |
dc.date.issued | 2001 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | http://hdl.handle.net/2445/47380 | - |
dc.description.abstract | In this paper, we have presented results on silicon thin films deposited by hot-wire CVD at low substrate temperatures (200 °C). Films ranging from amorphous to nanocrystalline were obtained by varying the filament temperature from 1500 to 1800 °C. A crystalline fraction of 50% was obtained for the sample deposited at 1700 °C. The results obtained seemed to indicate that atomic hydrogen plays a leading role in the obtaining of nanocrystalline silicon. The optoelectronic properties of the amorphous material obtained in these conditions are slightly poorer than the ones observed in device-grade films grown by plasma-enhanced CVD due to a higher hydrogen incorporation (13%). | - |
dc.format.extent | 4 p. | - |
dc.format.mimetype | application/pdf | - |
dc.language.iso | eng | - |
dc.publisher | Elsevier B.V. | - |
dc.relation.isformatof | Versió postprint del document publicat a: http://dx.doi.org/10.1016/S0040-6090(00)01615-1 | - |
dc.relation.ispartof | Thin Solid Films, 2001, vol. 383, num. 1-2, p. 189-191 | - |
dc.relation.uri | http://dx.doi.org/10.1016/S0040-6090(00)01615-1 | - |
dc.rights | (c) Elsevier B.V., 2001 | - |
dc.source | Articles publicats en revistes (Física Aplicada) | - |
dc.subject.classification | Silici | - |
dc.subject.classification | Pel·lícules fines | - |
dc.subject.classification | Nanocristalls | - |
dc.subject.classification | Deposició en fase de vapor | - |
dc.subject.classification | Cèl·lules solars | - |
dc.subject.other | Silicon | - |
dc.subject.other | Thin films | - |
dc.subject.other | Nanocrystals | - |
dc.subject.other | Vapor-plating | - |
dc.subject.other | Solar cells | - |
dc.title | Thin silicon films ranging from amorphous to nanocrystalline obtained by Hot-Wire CVD | - |
dc.type | info:eu-repo/semantics/article | - |
dc.type | info:eu-repo/semantics/acceptedVersion | - |
dc.identifier.idgrec | 160000 | - |
dc.date.updated | 2013-10-29T15:26:05Z | - |
dc.rights.accessRights | info:eu-repo/semantics/openAccess | - |
Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
Files in This Item:
File | Description | Size | Format | |
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160000.pdf | 58.25 kB | Adobe PDF | View/Open |
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