Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/61845
Title: Technological solution for the automatic replacement of the catalytic filaments in HWCVD
Author: Nos Aguilà, Oriol
Frigeri, Paolo Antonio
Bertomeu i Balagueró, Joan
Keywords: Deposició química en fase vapor
Silici
Catàlisi
Pel·lícules fines
Chemical vapor deposition
Silicon
Catalysis
Thin films
Issue Date: 30-Jan-2015
Publisher: Elsevier
Abstract: The degradation of the catalytic filaments is the main factor limiting the industrial implementation of the hot wire chemical vapor deposition (HWCVD) technique. Up to now, no solution has been found to protect the catalytic filaments used in HWCVD without compromising their catalytic activity. Probably, the definitive solution relies on the automatic replacement of the catalytic filaments. In this work, the results of the validation tests of a new apparatus for the automatic replacement of the catalytic filaments are reported. The functionalities of the different parts have been validated using a 0.2 mm diameter tungsten filament under uc-Si:H deposition conditions.
Note: Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2014.10.010
It is part of: Thin Solid Films, 2015, vol. 575, p. 30-33
Related resource: http://dx.doi.org/10.1016/j.tsf.2014.10.010
URI: http://hdl.handle.net/2445/61845
ISSN: 0040-6090
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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