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Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/98759
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dc.contributor.authorIzquierdo, Ricardo-
dc.contributor.authorBertomeu i Balagueró, Joan-
dc.contributor.authorSuys, Marc-
dc.contributor.authorSacher, Edward-
dc.contributor.authorMeunier, Michel-
dc.date.accessioned2016-05-23T13:58:55Z-
dc.date.available2016-05-23T13:58:55Z-
dc.date.issued1995-
dc.identifier.issn0169-4332-
dc.identifier.urihttp://hdl.handle.net/2445/98759-
dc.description.abstractCopper films have been deposited on TiN and fluoropolymer substrates from the KrF excimer-laser-assisted decomposition of Cu(hfac)(TMVS). Using H2 as the carrier gas, very uniform, shiny metal-like films were deposited with grain size of 50 to 100 nm. XPS measurements show that the precursor is reduced to metallic copper, and that a Cu/C atomic ratio of up to 17 is obtained.-
dc.format.extent5 p.-
dc.format.mimetypeapplication/pdf-
dc.language.isoeng-
dc.publisherElsevier B.V.-
dc.relation.isformatofVersió postprint del document publicat a: http://dx.doi.org/10.1016/0169-4332(94)00439-0-
dc.relation.ispartofApplied Surface Science, 1995, vol. 86, num. 1-4, p. 509-513-
dc.relation.urihttp://dx.doi.org/10.1016/0169-4332(94)00439-0-
dc.rights(c) Elsevier B.V., 1995-
dc.sourceArticles publicats en revistes (Física Aplicada)-
dc.subject.classificationCoure-
dc.subject.classificationLàsers-
dc.subject.classificationPel·lícules metàl·liques-
dc.subject.otherCopper-
dc.subject.otherLasers-
dc.subject.otherMetallic films-
dc.titleExcimer laser induced deposition of copper from Cu(hfac)(TMVS)-
dc.typeinfo:eu-repo/semantics/article-
dc.typeinfo:eu-repo/semantics/acceptedVersion-
dc.identifier.idgrec114375-
dc.date.updated2016-05-12T13:28:06Z-
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess-
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