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https://hdl.handle.net/2445/22090| Title: | Quantitative x-ray photoelectron spectroscopy study of Al/AlOx bilayers |
| Author: | Batlle Gelabert, Xavier Hattink, Bart Jan Labarta, Amílcar Åkerman, Johan J. Escudero, Roberto Schuller, Ivan K. |
| Keywords: | Espectroscòpia de raigs X Fotoelectrons Espectroscòpia d'electrons Materials magnètics Photoelectrons Electron spectroscopy Magnetic materials |
| Issue Date: | 2002 |
| Publisher: | American Institute of Physics |
| Abstract: | An x-ray photoelectron spectroscopy (XPS) analysis of Nb/Al wedge bilayers, oxidized by both plasma and natural oxidation, is reported. The main goal is to show that the oxidation state¿i.e., O:(oxidize)Al ratio¿, structure and thickness of the surface oxide layer, as well as the thickness of the metallic Al leftover, as functions of the oxidation procedure, can be quantitatively evaluated from the XPS spectra. This is relevant to the detailed characterization of the insulating barriers in (magnetic) tunnel junctions |
| Note: | Reproducció del document publicat a: http://dx.doi.org/10.1063/1.1478791 |
| It is part of: | Journal of Applied Physics, 2002, vol. 91, núm. 12, p. 10163-10168 |
| URI: | https://hdl.handle.net/2445/22090 |
| Related resource: | http://dx.doi.org/10.1063/1.1478791 |
| ISSN: | 0021-8979 |
| Appears in Collections: | Articles publicats en revistes (Física de la Matèria Condensada) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 196861.pdf | 149.93 kB | Adobe PDF | View/Open |
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