Polymorphous Si thin films from radio frequency plasmas of SiH4 diluted in Ar: A study by transmission electron microscopy and Raman spectroscopy

Viera Mármol, Gregorio; Huet, S.; Bertrán Serra, Enric; Boufendi, L.

Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/24793

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DC Field	Value	Language
dc.contributor.author	Viera Mármol, Gregorio	cat
dc.contributor.author	Huet, S.	cat
dc.contributor.author	Bertrán Serra, Enric	cat
dc.contributor.author	Boufendi, L.	cat
dc.date.accessioned	2012-05-03T07:23:35Z	-
dc.date.available	2012-05-03T07:23:35Z	-
dc.date.issued	2001-10-15	-
dc.identifier.issn	0021-8979	-
dc.identifier.uri	http://hdl.handle.net/2445/24793	-
dc.description.abstract	In this study, we present a detailed structural characterization by means of transmission electron microscopy and Raman spectroscopy of polymorphous silicon (pm-Si:H) thin films deposited using radio-frequency dust-forming plasmas of SiH4 diluted in Ar. Square-wave modulation of the plasma and gas temperature was varied to obtain films with different nanostructures. Transmission electron microscopy and electron diffraction have shown the presence of Si crystallites of around 2 nm in the pm-Si:H films, which are related to the nanoparticles formed in the plasma gas phase coming from their different growth stages, named particle nucleation and coagulation. Raman scattering has proved the role of the film nanostructure in the crystallization process induced ¿in situ¿ by laser heating.	eng
dc.format.extent	9 p.	-
dc.format.mimetype	application/pdf	-
dc.language.iso	eng	eng
dc.publisher	American Institute of Physics	-
dc.relation.isformatof	Reproducció del document publicat a: http://dx.doi.org/10.1063/1.1398066	-
dc.relation.ispartof	Journal of Applied Physics, 2001, vol. 90, núm. 8, p. 4272-4280	-
dc.relation.uri	http://dx.doi.org/10.1063/1.1398066	-
dc.rights	(c) American Institute of Physics, 2001	-
dc.source	Articles publicats en revistes (Física Aplicada)	-
dc.subject.classification	Pel·lícules fines	cat
dc.subject.classification	Espectroscòpia Raman	cat
dc.subject.classification	Nanoestructures	cat
dc.subject.classification	Microelectrònica	cat
dc.subject.classification	Radiofreqüència	cat
dc.subject.classification	Optoelectrònica	cat
dc.subject.other	Thin films	eng
dc.subject.other	Raman spectroscopy	eng
dc.subject.other	Nanostructures	eng
dc.subject.other	Microelectronics	eng
dc.subject.other	Radio frequency	eng
dc.subject.other	Optoelectronics	eng
dc.title	Polymorphous Si thin films from radio frequency plasmas of SiH4 diluted in Ar: A study by transmission electron microscopy and Raman spectroscopy	eng
dc.type	info:eu-repo/semantics/article	-
dc.type	info:eu-repo/semantics/publishedVersion	-
dc.identifier.idgrec	184386	-
dc.rights.accessRights	info:eu-repo/semantics/openAccess	-
Appears in Collections:	Articles publicats en revistes (Física Aplicada)

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