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http://hdl.handle.net/2445/98754
Title: | The role of hydrogen in the formation of microcrystalline silicon |
Author: | Fontcuberta i Morral, A. Bertomeu i Balagueró, Joan Roca i Cabarrocas, P. (Pere) |
Keywords: | Silici Hidrogen Temperatures baixes Pel·lícules fines Silicon Hydrogen Low temperatures Thin films |
Issue Date: | 2000 |
Publisher: | Elsevier B.V. |
Abstract: | The growth mechanisms of microcrystalline silicon thin films at low temperatures (100-250°C) by plasma CVD are still a matter of debate. We have shown that ue-Si:H formation proceeds through four phases (incubation, nucleation, growth and steady state) and that hydrogen plays a key role in this process, particularly during the incubation phase in which hydrogen modifies the amorphous silicon network and forms a highly porous phase where nucleation takes place. In this study we combine in-situ ellipsometry and dark conductivity measurements with ex-situ high resolution transmission electron microscopy to improve our understanding of microcrystalline silicon formation. |
Note: | Versió postprint del document publicat a: http://dx.doi.org/10.1016/S0921-5107(99)00324-4 |
It is part of: | Materials Science and Engineering B-Solid State Materials for Advanced Technology, 2000, vol. 69-70, p. 559-563 |
URI: | http://hdl.handle.net/2445/98754 |
Related resource: | http://dx.doi.org/10.1016/S0921-5107(99)00324-4 |
ISSN: | 0921-5107 |
Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
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