Please use this identifier to cite or link to this item:
http://hdl.handle.net/2445/98759
Title: | Excimer laser induced deposition of copper from Cu(hfac)(TMVS) |
Author: | Izquierdo, Ricardo Bertomeu i Balagueró, Joan Suys, Marc Sacher, Edward Meunier, Michel |
Keywords: | Coure Làsers Pel·lícules metàl·liques Copper Lasers Metallic films |
Issue Date: | 1995 |
Publisher: | Elsevier B.V. |
Abstract: | Copper films have been deposited on TiN and fluoropolymer substrates from the KrF excimer-laser-assisted decomposition of Cu(hfac)(TMVS). Using H2 as the carrier gas, very uniform, shiny metal-like films were deposited with grain size of 50 to 100 nm. XPS measurements show that the precursor is reduced to metallic copper, and that a Cu/C atomic ratio of up to 17 is obtained. |
Note: | Versió postprint del document publicat a: http://dx.doi.org/10.1016/0169-4332(94)00439-0 |
It is part of: | Applied Surface Science, 1995, vol. 86, num. 1-4, p. 509-513 |
URI: | http://hdl.handle.net/2445/98759 |
Related resource: | http://dx.doi.org/10.1016/0169-4332(94)00439-0 |
ISSN: | 0169-4332 |
Appears in Collections: | Articles publicats en revistes (Física Aplicada) |
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