Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/25086
Title: Nanoscale capacitance microscopy of thin dielectric films
Author: Gomila Lluch, Gabriel
Toset Gilabert, Jorge
Fumagalli, Laura, 1959-
Keywords: Dielèctrics
Nanotecnologia
Dielectrics
Nanotechnology
Issue Date: 25-Jul-2008
Publisher: American Institute of Physics
Abstract: We present an analytical model to interpret nanoscale capacitance microscopy measurements on thin dielectric films. The model displays a logarithmic dependence on the tip-sample distance and on the film thickness-dielectric constant ratio and shows an excellent agreement with finite-element numerical simulations and experimental results on a broad range of values. Based on these results, we discuss the capabilities of nanoscale capacitance microscopy for the quantitative extraction of the dielectric constant and the thickness of thin dielectric films at the nanoscale.
Note: Reproducció del document publicat a: http://dx.doi.org/10.1063/1.2957069
It is part of: Journal of Applied Physics, 2008, vol. 104, núm. 2, p. 024315
Related resource: http://dx.doi.org/10.1063/1.2957069
URI: http://hdl.handle.net/2445/25086
ISSN: 0021-8979
Appears in Collections:Articles publicats en revistes (Electrònica)
Articles publicats en revistes (Institut de Bioenginyeria de Catalunya (IBEC))

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