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http://hdl.handle.net/2445/28443
Title: | Silicon nanocluster sensitization of erbium ions under low-energy optical excitation |
Author: | Prtljaga, Nikola Navarro Urrios, Daniel Pitanti, Alessandro Ferrarese Lupi, Federico Garrido Fernández, Blas Pavesi, Lorenzo |
Keywords: | Fotònica Silici Nanocristalls Photonics Silicon Nanocrystals |
Issue Date: | 10-May-2012 |
Publisher: | American Institute of Physics |
Abstract: | The sensitizing action of amorphous silicon nanoclusters on erbium ions in thin silica films has been studied under low-energy (long wavelength) optical excitation. Profound differences in fast visible and infrared emission dynamics have been found with respect to the high-energy (short wavelength) case. These findings point out to a strong dependence of the energy transfer process on the optical excitation energy. Total inhibition of energy transfer to erbium states higher than the first excited state (4I13/2) has been demonstrated for excitation energy below 1.82 eV (excitation wavelength longer than 680 nm). Direct excitation of erbium ions to the first excited state (4I13/2) has been confirmed to be the dominant energy transfer mechanism over the whole spectral range of optical excitation used (540 nm¿680 nm). |
Note: | Reproducció del document publicat a: http://dx.doi.org/10.1063/1.4712626 |
It is part of: | Journal of Applied Physics, 2012, vol. 111, núm. 9, p. 094314 |
URI: | http://hdl.handle.net/2445/28443 |
Related resource: | http://dx.doi.org/10.1063/1.4712626 |
ISSN: | 0021-8979 |
Appears in Collections: | Articles publicats en revistes (Enginyeria Electrònica i Biomèdica) Publicacions de projectes de recerca finançats per la UE |
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