Please use this identifier to cite or link to this item: http://hdl.handle.net/2445/47148
Title: Development of laser-fired contacts for amorphous silicon layers obtained by Hot-Wire CVD
Author: Muñoz Ramos, David
Voz Sánchez, Cristóbal
Blanque, S.
Ibarz, D.
Bertomeu i Balagueró, Joan
Alcubilla González, Ramón
Keywords: Deposició química en fase vapor
Alumini
Cèl·lules solars
Làsers
Corrosió i anticorrosius
Semiconductors
Chemical vapor deposition
Aluminum
Solar cells
Lasers
Corrosion and anti-corrosives
Semiconductors
Issue Date: 2009
Publisher: Elsevier B.V.
Abstract: In this work we study aluminium laser-fired contacts for intrinsic amorphous silicon layers deposited by Hot-Wire CVD. This structure could be used as an alternative low temperature back contact for rear passivated heterojunction solar cells. An infrared Nd:YAG laser (1064 nm) has been used to locally fire the aluminium through the thin amorphous silicon layers. Under optimized laser firing parameters, very low specific contact resistances (ρc ∼ 10 mΩ cm2) have been obtained on 2.8 Ω cm p-type c-Si wafers. This investigation focuses on maintaining the passivation quality of the interface without an excessive increase in the series resistance of the device.
Note: Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.mseb.2008.10.049
It is part of: Materials Science and Engineering B-Solid State Materials for Advanced Technology, 2009, vol. 159-160, p. 23-26
Related resource: http://dx.doi.org/10.1016/j.mseb.2008.10.049
URI: http://hdl.handle.net/2445/47148
ISSN: 0921-5107
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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