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Title: In situ fast ellipsometric analysis of repetitive surface phenomena
Author: Campmany i Guillot, Josep, 1966-
Costa i Balanzat, Josep
Canillas i Biosca, Adolf
Andújar Bella, José Luis
Bertrán Serra, Enric
Keywords: El·lipsometria
Pel·lícules fines
Ciència dels materials
Thin films
Materials science
Issue Date: Aug-1997
Publisher: American Institute of Physics
Abstract: We present an ellipsometric technique and ellipsometric analysis of repetitive phenomena, based on the experimental arrangement of conventional phase modulated ellipsometers (PME) c onceived to study fast surface phenomena in repetitive processes such as periodic and triggered experiments. Phase modulated ellipsometry is a highly sensitive surface characterization technique that is widely used in the real-time study of several processes such as thin film deposition and etching. However, fast transient phenomena cannot be analyzed with this technique because precision requirements limit the data acquisition rate to about 25 Hz. The presented new ellipsometric method allows the study of fast transient phenomena in repetitive processes with a time resolution that is mainly limited by the data acquisition system. As an example, we apply this new method to the study of surface changes during plasma enhanced chemical vapor deposition of amorphous silicon in a modulated radio frequency discharge of SiH4. This study has revealed the evolution of the optical parameters of the film on the millisecond scale during the plasma on and off periods. The presented ellipsometric method extends the capabilities of PME arrangements and permits the analysis of fast surface phenomena that conventional PME cannot achieve.
Note: Reproducció del document publicat a:
It is part of: Review of Scientific Instruments, 1997, vol. 68, p. 3135-3139
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ISSN: 0034-6748
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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