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Title: Nanoparticles in SiH4-Ar plasma: Modelling and comparison with experimental data
Author: Gordiets, B. F.
Inestrosa Izurieta, María José
Navarro, A.
Bertrán Serra, Enric
Keywords: Silici
Plasma (Gasos ionitzats)
Pel·lícules fines
Dissociació (Química)
Plasma (Ionized gases)
Thin films
Issue Date: 2011
Publisher: American Institute of Physics
Abstract: Experimental and theoretical investigations for growth of silicon nanoparticles (4 to 14 nm) in radio frequency discharge were carried out. Growth processes were performed with gas mixtures of SiH4 and Ar in a plasma chemical reactor at low pressure. A distinctive feature of presented kinetic model of generation and growth of nanoparticles (compared to our earlier model) is its ability to investigate small"critical" dimensions of clusters, determining the rate of particle production and taking into account the influence of SiH2 and Si2Hm dimer radicals. The experiments in the present study were extended to high pressure (≥20 Pa) and discharge power (≥40 W). Model calculations were compared to experimental measurements, investigating the dimension of silicon nanoparticles as a function of time, discharge power, gas mixture, total pressure, and gas flow.
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It is part of: Journal of Applied Physics, 2011, vol. 110, p. 103302-1-103302-8
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ISSN: 0021-8979
Appears in Collections:Articles publicats en revistes (Física Aplicada)

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