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Issue DateTitleAuthor(s)
1-Dec-1984Reconstruction of the SiO2 structure damaged by low-energy Ar-implanted ionsGarrido Fernández, Blas; Samitier i Martí, Josep; Bota Ferragut, Sebastián Antonio; Moreno, J. A.; Montserrat i Martí, Josep; Morante i Lleonart, Joan Ramon
15-Feb-1997Analysis of geometrical effects on the behavior of transverse and longitudinal modes of amorphous silicon compoundsMoreno, J. A.; Garrido Fernández, Blas; Samitier i Martí, Josep; Morante i Lleonart, Joan Ramon
1994Configurational statistical model for the damaged structure of silicon oxide after ion implantationGarrido Beltrán, Lluís; Samitier i Martí, Josep; Morante i Lleonart, Joan Ramon; Montserrat i Martí, Josep; Domínguez, Carlos (Domínguez Horna)
1992Anomalous optical and electrical recovery process of photoquenched EL2 defect produced by oxygen and boron ion implantation in gallium arsenideSamitier i Martí, Josep; Marco Colás, Santiago; Pérez Rodríguez, Alejandro; Morante i Lleonart, Joan Ramon; Boher, P.; Renaud, M.
1991On the artificial creation of the EL2 center by means of boron implantation in gallium arsenideMorante i Lleonart, Joan Ramon; Pérez Rodríguez, Alejandro; Samitier i Martí, Josep; Romano Rodríguez, Albert
1986Majority carrier capture cross section determination in the large deep trap concentration casesMorante i Lleonart, Joan Ramon; Samitier i Martí, Josep; Cornet i Calveras, Albert; Herms Berenguer, Atilà; Cartujo Estébanez, Pedro
1986Analysis of the near-intrinsic and extrinsic photocapacitance due to the EL2 level in boron implanted GaAsMorante i Lleonart, Joan Ramon; Samitier i Martí, Josep; Pérez Rodríguez, Alejandro; Altelarrea Soria, Hermenegildo; Gourrier, S.