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2008-07-25

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Please use this identifier to cite or link to this item: https://hdl.handle.net/2445/25086

Nanoscale capacitance microscopy of thin dielectric films

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http://dx.doi.org/10.1063/1.2957069

Abstract

We present an analytical model to interpret nanoscale capacitance microscopy measurements on thin dielectric films. The model displays a logarithmic dependence on the tip-sample distance and on the film thickness-dielectric constant ratio and shows an excellent agreement with finite-element numerical simulations and experimental results on a broad range of values. Based on these results, we discuss the capabilities of nanoscale capacitance microscopy for the quantitative extraction of the dielectric constant and the thickness of thin dielectric films at the nanoscale.

Subject

Dielèctrics, Nanotecnologia

Subject (English)

Dielectrics, Nanotechnology

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Articles publicats en revistes (Enginyeria Electrònica i Biomèdica)
Articles publicats en revistes (Institut de Bioenginyeria de Catalunya (IBEC))

Citation

GOMILA LLUCH, Gabriel, TOSET GILABERT, Jorge and FUMAGALLI, Laura. Nanoscale capacitance microscopy of thin dielectric films. Journal of Applied Physics. 2008. Vol. 104, num. 2, pags. 024315. ISSN 0021-8979. [consulted: 18 of June of 2026]. Available at: https://hdl.handle.net/2445/25086

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