Document type
ArticleVersion
Published versionPublication date
All rights reserved
Please use this identifier to cite or link to this item: https://hdl.handle.net/2445/25059
In situ fast ellipsometric analysis of repetitive surface phenomena
Journal Title
Director/Tutor
Journal ISSN
Volume Title
Related resource
Abstract
We present an ellipsometric technique and ellipsometric analysis of repetitive phenomena, based on the experimental arrangement of conventional phase modulated ellipsometers (PME) c onceived to study fast surface phenomena in repetitive processes such as periodic and triggered experiments. Phase modulated ellipsometry is a highly sensitive surface characterization technique that is widely used in the real-time study of several processes such as thin film deposition and etching. However, fast transient phenomena cannot be analyzed with this technique because precision requirements limit the data acquisition rate to about 25 Hz. The presented new ellipsometric method allows the study of fast transient phenomena in repetitive processes with a time resolution that is mainly limited by the data acquisition system. As an example, we apply this new method to the study of surface changes during plasma enhanced chemical vapor deposition of amorphous silicon in a modulated radio frequency discharge of SiH4. This study has revealed the evolution of the optical parameters of the film on the millisecond scale during the plasma on and off periods. The presented ellipsometric method extends the capabilities of PME arrangements and permits the analysis of fast surface phenomena that conventional PME cannot achieve.
Subject (English)
Citation
Citation
CAMPMANY I GUILLOT, Josep, et al. In situ fast ellipsometric analysis of repetitive surface phenomena. Review of Scientific Instruments. 1997. Vol. 68, num. 3135-3139. ISSN 0034-6748. [consulted: 14 of June of 2026]. Available at: https://hdl.handle.net/2445/25059