Carregant...
Fitxers
Tipus de document
ArticleVersió
Versió enviadaData de publicació
Tots els drets reservats
Si us plau utilitzeu sempre aquest identificador per citar o enllaçar aquest document: https://hdl.handle.net/2445/47124
Influence of RF power on the properties of sputtered ZnO:Al thin films
Títol de la revista
Director/Tutor
ISSN de la revista
Títol del volum
Recurs relacionat
Resum
Transparent conducting, aluminium doped zinc oxide thin films (ZnO:Al) were deposited by radio frequency (RF) magnetron sputtering. The RF power was varied from 60 to 350Wwhereas the substrate temperature was kept at 160 °C. The structural, electrical and optical properties of the as-deposited films were found to be influenced by the deposition power. The X-ray diffraction analysis showed that all the films have a strong preferred orientation along the [001] direction. The crystallite size was varied from 14 to 36 nm, however no significant change was observed in the case of lattice constant. The optical band gap varied in the range 3.44-3.58 eV. The lowest resistivity of 1.2×10 -3Vcm was shown by the films deposited at 250 W. The mobility of the films was found to increase with the deposition power.
Matèries (anglès)
Citació
Col·leccions
Citació
ANTONY, Aldrin, CARRERAS SEGUÍ, Paz, KEITZL, Thomas, ROLDÁN MOLINERO, Rubén, NOS AGUILÀ, Oriol, FRIGERI, Paolo antonio, ASENSI LÓPEZ, José miguel, BERTOMEU I BALAGUERÓ, Joan. Influence of RF power on the properties of sputtered ZnO:Al thin films. _physica status solidi (a)_. 2010. Vol. 207, núm. 7, pàgs. 1577-1580. [consulta: 7 de febrer de 2026]. ISSN: 1862-6300. [Disponible a: https://hdl.handle.net/2445/47124]