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Please use this identifier to cite or link to this item: https://hdl.handle.net/2445/32209
Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions.
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We have studied the current transport and electroluminescence properties of metal oxide semiconductor MOS devices in which the oxide layer, which is codoped with silicon nanoclusters and erbium ions, is made by magnetron sputtering. Electrical measurements have allowed us to identify a Poole-Frenkel conduction mechanism. We observe an important contribution of the Si nanoclusters to the conduction in silicon oxide films, and no evidence of Fowler-Nordheim tunneling. The results suggest that the electroluminescence of the erbium ions in these layers is generated by energy transfer from the Si nanoparticles. Finally, we report an electroluminescence power efficiency above 10−3%. © 2009 American Institute of Physics. doi:10.1063/1.3213386
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JAMBOIS, Olivier, et al. Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions. Journal of Applied Physics. 2009. Vol. 106, num. 063526-1-063526-6. ISSN 0021-8979. [consulted: 14 of June of 2026]. Available at: https://hdl.handle.net/2445/32209