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Si us plau utilitzeu sempre aquest identificador per citar o enllaçar aquest document: https://hdl.handle.net/2445/231425
Spatial characterization of thickness in thin films deposited by thermal evaporation
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This work analyzes the spatial thickness distribution of aluminum thin films deposited onto a glass substrate via thermal evaporation. A methodology combining a gridded lift-off mask with optical mapping enabled precise large-area topographic characterization. The experimental data were fitted to the Knudsen cosine law (R2 = 0.92), confirming a radial thickness decay with a maximum central thickness of d0 = (93.0 ± 0.5) nm. The empirical beaming parameter (n = 0.9 ± 0.3) is highly consistent with an ideal planar surface source (n = 1). This demonstrates that the crucible used distributes the atomic flux predictably, acting as a flat emitting area without inducing severe collimation. Finally, the preservation of this distinct directional profile is attributed to the high-vacuum regime, which prevents the intermolecular flux dispersion typical of higher working pressures.
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Treballs Finals de Grau de Física, Facultat de Física, Universitat de Barcelona, Curs: 2026, Tutor: Regina Galceran Vercher
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LARA RODRÍGUEZ, Raül. Spatial characterization of thickness in thin films deposited by thermal evaporation. [consulted: 12 of September of 2026]. Available at: https://hdl.handle.net/2445/231425