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2001

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Si us plau utilitzeu sempre aquest identificador per citar o enllaçar aquest document: https://hdl.handle.net/2445/24308

Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings

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http://dx.doi.org/10.1364/AO.40.002190

Resum

A method for characterizing the microroughness of samples in optical coating technology is developed. Measurements over different spatial-frequency ranges are composed into a single power spectral density (PSD) covering a large bandwidth. This is followed by the extraction of characteristic parameters through fitting of the PSD to a suitable combination of theoretical models. The method allows us to combine microroughness measurements performed with different techniques, and the fitting procedure can be adapted to any behavior of a combined PSD. The method has been applied to a set of ion-beam-sputtered fluoride vacuum-UV coatings with increasing number of alternative low- and high-index layers. Conclusions about roughness development and microstructural growth are drawn.

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Òptica electrònica

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Electron optics

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Citació

FERRÉ BORRULL, Josep, DUPARRÉ, Angela and QUESNEL, Etienne. Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings. Applied Optics. 2001. Vol. 40, num. 13, pags. 2190-2199. ISSN 0003-6935. [consulted: 28 of May of 2026]. Available at: https://hdl.handle.net/2445/24308

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