Production of carbon nanotubes by PECVD and their applications to supercapacitors

Abstract

Plasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically dense-aligned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD). In this work, we used magnetron sputtering to deposit iron layer as a catalyst on silicon wafers. After that, radio frequency (rf) assisted PECVD reactor was used to grow CNTs. They were treated with water plasma and finally covered by MnO2 as dielectric layer in order to use CNTs as electrode for supercapacitors. Optimization of annealing time, reaction time and temperature, water plasma time and MnO2 deposition time were performed to find appropriate conditions to improve the characteristics of supercapacitors. SEM (Scanning Electron Microscopy), TEM (Transmission Electron Microscopy), AFM (Atomic Force Microscopy) and Raman spectroscopy were used to characterize obtained electrodes.