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Article

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Published version

Publication date

1992-01

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Please use this identifier to cite or link to this item: https://hdl.handle.net/2445/24984

Computer-aided procedure for optimization of layer thickness uniformity in thermal evaporation physical vapor deposition chambers for lens coating

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http://dx.doi.org/10.1116/1.578073

Abstract

A computer-aided method to improve the thickness uniformity attainable when coating multiple substrates inside a thermal evaporation physical vapor deposition unit is presented. The study is developed for the classical spherical (dome-shaped) calotte and also for a plane sector reversible holder setup. This second arrangement is very useful for coating both sides of the substrate, such as antireflection multilayers on lenses. The design of static correcting shutters for both kinds of configurations is also discussed. Some results of using the method are presented as an illustration.

Subject

Disseny assistit per ordinador, Pel·lícules fines, Filtres òptics, Lents

Subject (English)

Computer-aided design, Thin films, Light filters, Lenses

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Articles publicats en revistes (Física Aplicada)

Citation

BOSCH I PUIG, Salvador. Computer-aided procedure for optimization of layer thickness uniformity in thermal evaporation physical vapor deposition chambers for lens coating. Journal of Vacuum Science Technology A-Vacuum Surfaces and Films. vol. 10. Vol. 1, num. 98-104. ISSN 0734-2101. [consulted: 19 of August of 2026]. Available at: https://hdl.handle.net/2445/24984

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