Carregant...
Fitxers
Tipus de document
ArticleVersió
Versió publicadaData de publicació
Llicència de publicació
Si us plau utilitzeu sempre aquest identificador per citar o enllaçar aquest document: https://hdl.handle.net/2445/178437
Deposition and characterisation of sputtered molybdenum oxide thin films with hydrogen atmosphere
Títol de la revista
Director/Tutor
ISSN de la revista
Títol del volum
Recurs relacionat
Resum
Sputtered films of reduced molybdenum oxide (MoOx) with a molybdenum trioxide target in different pressures and atmospheres were deposited in varying temperatures. Compositional, optic, and electric characteristics of the samples were studied. X-ray photoelectron spectroscopy revealed reduced states when working in the hydrogen + argon atmosphere implying that stoichiometry could be controlled by adding some hydrogen in the sputtering chamber. The effect of slightly increasing the substrate temperature during deposition was also studied and lead to the presence of metastable Mo4+ states at 3 mTorr. Optical properties match the ones already in the literature, and transmittances of 90% were achieved. The results support sputtering as a viable method of depositing MoOx films apart from thermal evaporation for many applications.
Matèries
Matèries (anglès)
Citació
Col·leccions
Citació
LÓPEZ-PINTÓ, Nicolau, TOM, Thomas, BERTOMEU I BALAGUERÓ, Joan, ASENSI LÓPEZ, José miguel, ROS COSTALS, Eloi, ORTEGA VILLASCLARAS, Pablo rafael, VOZ SÁNCHEZ, Cristóbal. Deposition and characterisation of sputtered molybdenum oxide thin films with hydrogen atmosphere. _Applied Surface Science_. 2021. Vol. 563, núm. 150285. [consulta: 20 de gener de 2026]. ISSN: 0169-4332. [Disponible a: https://hdl.handle.net/2445/178437]