Bipolar pulsed excitation of erbium-doped nanosilicon light emitting diodes

dc.contributor.authorAnopchenko, Alekseicat
dc.contributor.authorTengattini, Andreacat
dc.contributor.authorMarconi, Alessandrocat
dc.contributor.authorPrtljaga, Nikolacat
dc.contributor.authorRamírez Ramírez, Joan Manelcat
dc.contributor.authorJambois, Oliviercat
dc.contributor.authorBerencén Ramírez, Yonder Antoniocat
dc.contributor.authorNavarro Urrios, Danielcat
dc.contributor.authorGarrido Fernández, Blascat
dc.contributor.authorMilesi, F.cat
dc.contributor.authorColonna, Jean-Philippecat
dc.contributor.authorFedeli, Jean-Marccat
dc.contributor.authorPavesi, Lorenzocat
dc.date.accessioned2012-05-11T11:19:46Z
dc.date.available2012-05-11T11:19:46Z
dc.date.issued2012-03-21
dc.description.abstractHigh quantum efficiency erbium doped silicon nanocluster (Si-NC:Er) light emitting diodes (LEDs) were grown by low-pressure chemical vapor deposition (LPCVD) in a complementary metal-oxide-semiconductor (CMOS) line. Erbium (Er) excitation mechanisms under direct current (DC) and bipolar pulsed electrical injection were studied in a broad range of excitation voltages and frequencies. Under DC excitation, Fowler-Nordheim tunneling of electrons is mediated by Er-related trap states and electroluminescence originates from impact excitation of Er ions. When the bipolar pulsed electrical injection is used, the electron transport and Er excitation mechanism change. Sequential injection of electrons and holes into silicon nanoclusters takes place and nonradiative energy transfer to Er ions is observed. This mechanism occurs in a range of lower driving voltages than those observed in DC and injection frequencies higher than the Er emission rate.eng
dc.format.extent5 p.
dc.format.mimetypeapplication/pdf
dc.identifier.idgrec600585
dc.identifier.issn0021-8979
dc.identifier.urihttps://hdl.handle.net/2445/25462
dc.language.isoengeng
dc.publisherAmerican Institute of Physics
dc.relation.isformatofReproducció del document publicat a: http://dx.doi.org/10.1063/1.3694680cat
dc.relation.ispartofJournal of Applied Physics, 2012, vol. 111, núm. 6, p. 063102-1-063102-5
dc.relation.projectIDinfo:eu-repo/grantAgreement/EC/FP7/224312/EU//HELIOS
dc.relation.urihttp://dx.doi.org/10.1063/1.3694680
dc.rights(c) American Institute of Physics, 2012
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess
dc.sourceArticles publicats en revistes (Enginyeria Electrònica i Biomèdica)
dc.subject.classificationFotònicacat
dc.subject.classificationÒptica integradacat
dc.subject.otherPhotonicseng
dc.subject.otherIntegrated opticseng
dc.titleBipolar pulsed excitation of erbium-doped nanosilicon light emitting diodeseng
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion

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